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    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://163.15.40.127/ir/handle/987654321/1865


    题名: Low Temperature Method for Enhancing Ferroelectric Thin Films in Non-Volatile Random Access Memory Devices
    作者: Kuan, Ming-Chang
    Chen, Kai-Huang
    Tzou, Wen-Cheng
    Cheng, Chien-Min
    Lin, Yi-Jun
    (東方設計學院電子與資訊系)
    贡献者: 東方設計學院電子與資訊系
    关键词: SCF process
    SBN thin film
    Memory window
    Leakage current density
    NvFeRAM
    日期: 2011-05
    上传时间: 2015-07-08 14:45:44 (UTC+8)
    摘要: In this study, the electrical properties of as-deposited Sr0.4Ba0.6Nb2O6 (SBN) ferroelectric thin films on SiO2/Si(100) substrates were improved by low temperature supercritical carbon dioxide fluid (SCF) process treatment. The as-deposited SBN ferroelectric thin films were treated by SCF process which mixed with pure H2O and propyl alcohol. After SCF process treatment, the memory windows increased in C-V curves, and the passivation of oxygen vacancy and defect in leakage current density curves were obtained. In addition, the improvement properties of as-deposited SBN thin films after SCF process treatment were found by XPS, C-V, and J-E measurement. Finally, the mechanism concerning the dependence of electrical properties of the SBN ferroelectric thin films on the SCF process was discussed.
    關聯: Advanced Materials Reaearch, Vol.239-242, pp.2628-2631
    显示于类别:[電子與資訊系(遊戲動畫系、動畫科)] 期刊論文

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