English  |  正體中文  |  简体中文  |  全文笔数/总笔数 : 848/2341 (36%)
造访人次 : 5042171      在线人数 : 42
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜寻范围 查询小技巧:
  • 您可在西文检索词汇前后加上"双引号",以获取较精准的检索结果
  • 若欲以作者姓名搜寻,建议至进阶搜寻限定作者字段,可获得较完整数据
  • 进阶搜寻
    主页登入上传说明关于TFIR管理 到手机版


    jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://163.15.40.127/ir/handle/987654321/1418


    题名: Structural and Mechanical Characteristics of (103)AIN Films Prepared by Radio Frequency Magnetron Sputtering
    作者: Yang, Ping-Feng
    Jian, Sheng-Rui
    Wu, Sean
    Lai, Yi-Shao
    Wang, Chung-Ting
    Chen, Rong-Sheng
    吳信賢
    (東方技術學院電子與資訊系)
    贡献者: 東方技術學院電子與資訊系
    关键词: Aluminum mitride
    thin film
    nanoindentation
    nanoscratch
    日期: 2009-01
    上传时间: 2012-11-21 09:03:09 (UTC+8)
    摘要: The (103)-oriented aluminum nitride (AIN) thin film is an attractive piezoelectric material for the applications in surface acoustic wave and film bulk acoustic wave resonator devices. In this work, we repot structural and mechanical sputtering powers at 150, 250, and 350W. Comparisons were made on their crystalline structures with X-ray different, surface morphologies with atomic force microscopy, mechanical properties with nanoindentation, and tribological responses with nanoscratch. Results indicate that for the sputtering power of 350W, a high-quality (103) AIN thin film, whose hardness is 18.91 ± 1.03GPa and Young’s modulus is 242.26 ± 8.92GPa, was obtained with the most compact surface condition.
    關聯: Applid Surface Science, Vol.255 no.11, pp.5984-5988
    显示于类别:[電子與資訊系(遊戲動畫系、動畫科)] 期刊論文

    文件中的档案:

    没有与此文件相关的档案.



    在TFIR中所有的数据项都受到原著作权保护.

    TAIR相关文章

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 回馈