Structural and Mechanical Characteristics of (103)AIN Films Prepared by Radio Frequency Magnetron Sputtering

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題名:	Structural and Mechanical Characteristics of (103)AIN Films Prepared by Radio Frequency Magnetron Sputtering
作者:	Yang, Ping-Feng Jian, Sheng-Rui Wu, Sean Lai, Yi-Shao Wang, Chung-Ting Chen, Rong-Sheng 吳信賢 (東方技術學院電子與資訊系)
貢獻者:	東方技術學院電子與資訊系
關鍵詞:	Aluminum mitride thin film nanoindentation nanoscratch
日期:	2009-01
上傳時間:	2012-11-21 09:03:09 (UTC+8)
摘要:	The (103)-oriented aluminum nitride (AIN) thin film is an attractive piezoelectric material for the applications in surface acoustic wave and film bulk acoustic wave resonator devices. In this work, we repot structural and mechanical sputtering powers at 150, 250, and 350W. Comparisons were made on their crystalline structures with X-ray different, surface morphologies with atomic force microscopy, mechanical properties with nanoindentation, and tribological responses with nanoscratch. Results indicate that for the sputtering power of 350W, a high-quality (103) AIN thin film, whose hardness is 18.91 ± 1.03GPa and Young’s modulus is 242.26 ± 8.92GPa, was obtained with the most compact surface condition.
關聯:	Applid Surface Science, Vol.255 no.11, pp.5984-5988
顯示於類別:	[電子與資訊系(遊戲動畫系、動畫科)] 期刊論文

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