利用二氧化碳超臨界流體技術提升鐵電薄膜特性之研究

TFIR > Department of Electronics Engineering and Computer Science > conference > Item 987654321/1880

Please use this identifier to cite or link to this item: http://163.15.40.127/ir/handle/987654321/1880

Title:	利用二氧化碳超臨界流體技術提升鐵電薄膜特性之研究
Authors:	吳光耀蔡宗鳴吳柏宗陳開煌 (東方設計學院電子與資訊系)
Contributors:	東方設計學院電子與資訊系
Keywords:	鐵電薄膜記憶窗口射頻磁控濺鍍法二氧化碳超臨界流體電滯曲線
Date:	2010-11
Issue Date:	2015-07-08 15:11:14 (UTC+8)
Publisher:	高雄縣大樹鄉：義守大學
Relation:	99年中國材料科學學會年會論文摘要集, 頁183 中國材料科學學會年會 2010 MRS-T ANNUAL MEETING
Appears in Collections:	[Department of Electronics Engineering and Computer Science] conference

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