Effect of Oxygen Concentration on Characteristic of Ba(Zr0.1Ti0.9)O3 Thin Films Deposited on indium Tin Oxide/Glass Substrates

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Title:	Effect of Oxygen Concentration on Characteristic of Ba(Zr0.1Ti0.9)O3 Thin Films Deposited on indium Tin Oxide/Glass Substrates
Authors:	Chen., Kai-Huang Yang, Cheng-Fu Chang, Chia-Hsing Lin, Yi-Jun 陳開煌 (東方技術學院電子與資訊系)
Contributors:	東方技術學院電子與資訊系
Date:	2009-09
Issue Date:	2012-11-21 09:31:20 (UTC+8)
Abstract:	In this study, the perovskite Ba(Zr0.1Ti0.9)O3 (Bz1T9) ferroelectric thin films deposited on indium tin oxide (ITO)/glass substrates for applications in system-on-panel (SOP) devices are produced and investigated. The optimal sputtering conditions of as-deposited Bz1T9 thin films are an rf power of 160W, a chamber pressure of 10m Torr, a substrate temperature of 580°C, and an oxygen concentration of 40%. The effect of oxygen concentration on the physical and electrical characteristics of Bz1T9 thin films is determined. For different oxygen concentrations, the thickness and deposition rate are calculates by scanning electron microscopy (SEM). From polarization versus electron field curves, the 2Pr value and coercive field of Bz1T9 thin films are determined to be 7μC/cm2 and 250kV/cm, respectively. In addition, the maximum dielectric, leakage current density, and transmittance within the ultraviolet-visible (UV-vis) spectrum are investigated.
Relation:	Japanese Journal of Applied Physics, no.48, pp.091401-5
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