Rapid thermal annealing effects on the structural and optical properties of ZnO films deposited on Si substrates

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題名:	Rapid thermal annealing effects on the structural and optical properties of ZnO films deposited on Si substrates
作者:	Lee, Yueh-Chien Hu, Sheng-Yao Water, Walter Tiong, Kwong-Kau Feng, Zhe-Chuan Chen, Yen-Ting Huang, Jen-Ching Lee, Jyh-Wei Huang, Chia-Chih Shen, Jyu-Lai Cheng, Mou-Hong 胡勝耀 (東方技術學院電機工程系)
貢獻者:	東方技術學院電機工程系
關鍵詞:	Zinc oxide Annealing Photoluminescence X-ray diffraction
日期:	2009-02
上傳時間:	2012-11-14 11:33:50 (UTC+8)
摘要:	The structural and opticalproperties of ZnOfilmsdeposited on Sisubstrate following rapidthermalannealing (RTA) have been investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), and photoluminescence (PL) measurements. After RTA treatment, the XRD spectra have shown an effective relaxation of the residual compressive stress, an increase of the intensity and narrowing of the full-width at half-maximum (FWHM) of the (0 0 2) diffraction peak of the as-grown ZnOfilm. AFM images show roughening of the film surface due to increase of grain size after RTA. The PL spectrum reveals a significant improvement in the UV luminescence of ZnOfilms following RTA at 800 °C for 1 min.
關聯:	Journal of Luminescence, no.129, pp.148-152
顯示於類別:	[電機工程系(數位科技系、玩具科)] 期刊論文

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